US Patent 11177111 Defect observation device
Patent 11177111 was granted and assigned to Hitachi on November, 2021 by the United States Patent and Trademark Office.
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A defect observation device is configured to include a charged particle microscope and a controller including a control unit that controls the charged particle microscope, a storage unit, and an arithmetic unit, in which the control unit controls the charged particle microscope under a first condition to acquire a first image of an observation target region of the sample, the arithmetic unit extracts first position information of the observation target region from the obtained first image, the control unit controls the charged particle microscope under a second condition to acquire a second image of the observation target region of the sample, and the arithmetic unit performs an image quality conversion process to match the image quality of the acquired second image with the image quality of the first image using the image quality conversion process parameters to process the second image subjected to the image quality conversion process.
US Patent 11177111 Defect observation device
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