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US Patent 11183404 Diffuser and semiconductor processing system using same

Patent 11183404 was granted and assigned to Taiwan Semiconductor Manufacturing Company on November, 2021 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Current Assignee
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
111834040
Patent Inventor Names
Yi-Ming Lin0
Chao-Hung Wan0
Sheng-chun Yang0
Date of Patent
November 23, 2021
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Patent Application Number
163956660
Date Filed
April 26, 2019
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Patent Primary Examiner
‌
Jessica Cahill
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Patent abstract

A diffuser for diffusing a gas includes a base portion and a head portion fluidly coupled to the base portion. The head portion includes a diffuser element configured to diffuse a first fraction of the gas through a circumference of the diffuser element and a second fraction of the gas through an end surface of the diffuser element. The head portion further includes a connecting structure having a first connecting portion configured to receive a portion of the diffuser element therein and a second connecting portion protruding outwardly from the first connecting portion and configured to couple to the base portion.

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