Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
Date of Patent
November 30, 2021
0Patent Application Number
165520710
Date Filed
August 27, 2019
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a divalent hydrocarbon group and a carboxylate, fluorine-free sulfonamide, sulfonamide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
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