Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Date of Patent
May 9, 2023
0Patent Application Number
172122750
Date Filed
March 25, 2021
0Patent Citations
Patent Citations Received
Patent Primary Examiner
A resist composition is provided comprising a base polymer and a quencher comprising a salt compound consisting of a cyclic ammonium cation and a 1,1,1,3,3,3-hexafluoro-2-propoxide anion having a trifluoromethyl, hydrocarbylcarbonyl or hydrocarbyloxycarbonyl group bonded thereto. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
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