Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Tomomi Watanabe0
Date of Patent
June 4, 2024
0Patent Application Number
173814050
Date Filed
July 21, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
A resist composition is provided comprising a base polymer and a quencher comprising a cyclic ammonium salt having a fluorinated saturated hydrocarbyl group or fluorinated aryl group. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
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