Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 23, 2008
Patent Application Number
11543833
Date Filed
October 6, 2006
Patent Citations Received
Patent Primary Examiner
Patent abstract
Chemically amplified resist compositions comprising amine compounds having a fluorinated alkyl group offer an excellent resolution and a precise pattern profile and are useful in microfabrication by KrF, ArF, F2, EUV, EB or X-ray lithography. They are also effective in the immersion lithography.
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