US Patent 8921026 Basic compound, chemically amplified resist composition, and patterning process

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Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

89210260

Patent Inventor Names

Jun Hatakeyama0

Masayoshi Sagehashi0

Takeru Watanabe0

Date of Patent

December 30, 2014

Patent Application Number

133111920

Date Filed

December 5, 2011

Patent Citations Received

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US Patent 12117728 Resist composition and patterning process

‌

US Patent 11782343 Resist composition and patterning process

‌

US Patent 12001139 Resist composition and patterning process

Patent Primary Examiner

‌

Cynthia H Kelly

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