Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masaki Ohashi0
Jun Hatakeyama0
Takayuki Fujiwara0
Date of Patent
August 16, 2022
0Patent Application Number
167877430
Date Filed
February 11, 2020
0Patent Citations Received
Patent Primary Examiner
A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
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