US Patent 11187988 Exposure apparatus, and article manufacturing method
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Patent abstract
An exposure apparatus according to the present invention includes an illumination optical system including a first optical modulation unit having a plurality of optical modulation elements, a second optical modulation unit having a plurality of optical modulation elements, and an imaging optical system forming optical images on a predetermined plane by using lights from the first optical modulation unit and the second optical modulation unit, and a projection optical system projecting the optical image formed on the predetermined plane onto a substrate.
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Patent Inventor Names
Michio Kono0
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Patent Jurisdiction
Patent Number
111879880
Date of Patent
November 30, 2021
0Patent Application Number
168994370
Date Filed
June 11, 2020
0Official Website
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US Patent 11187988 Exposure apparatus, and article manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
11187988
Date of patent
November 30, 2021
Patent application number
16899437
Date Filed
June 11, 2020
Patent primary examiner
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