US Patent 11215929 Photoresist system and method
Patent 11215929 was granted and assigned to Taiwan Semiconductor Manufacturing Company on January, 2022 by the United States Patent and Trademark Office.
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Patent abstract
A photoresist apparatus and a method are provided. The photoresist apparatus includes a pre-baking apparatus. The pre-baking apparatus includes: a hot-plate, a first cover over the hot-plate, a second cover over the first cover, a first heating element extending along a topmost surface of the first cover, and a second heating element extending along a topmost surface of the second cover.
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Patent Number
112159290
Date of Patent
January 4, 2022
0Patent Application Number
162289770
Date Filed
December 21, 2018
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
112159290
Date of Patent
January 4, 2022
0Patent Application Number
162289770
Date Filed
December 21, 2018
0Official Website
Patent Primary Examiner
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US Patent 11215929 Photoresist system and method
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
11215929
Date of patent
January 4, 2022
Patent application number
16228977
Date Filed
December 21, 2018
Patent primary examiner
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