Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 11, 2022
Patent Application Number
15835328
Date Filed
December 7, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate processing apparatus includes a partition comprising at least one through-hole, a conduit arranged in the partition through the through-hole, a gas supply unit connected to the conduit, and a low dielectric material provided between a side wall of the through-hole and the conduit.
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