Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wen Xiao0
Sanjay Bhat0
Vibhu Jindal0
Date of Patent
February 1, 2022
0Patent Application Number
168016420
Date Filed
February 26, 2020
0Patent Citations
Patent Primary Examiner
Patent abstract
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
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