Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Pei-Cheng Hsu0
Tsiao-Chen Wu0
Date of Patent
February 8, 2022
Patent Application Number
16656227
Date Filed
October 17, 2019
Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
A reflective mask includes a substrate, a light absorbing layer over the substrate, a reflective layer over the light absorbing layer, and an absorption pattern over the reflective layer. The reflective layer covers a first portion of the light absorbing layer, and a second portion of the light absorbing layer is free from coverage by the reflective layer.
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