Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Pei-Cheng Hsu0
Ta-Cheng Lien0
Hsin-Chang Lee0
Date of Patent
June 18, 2024
0Patent Application Number
179917400
Date Filed
November 21, 2022
0Patent Citations
...
Patent Primary Examiner
CPC Code
Patent abstract
A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The intermediate layer includes a material having a lower hydrogen diffusivity than a material of the capping layer.
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