Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shinn-Sheng Yu0
Tsung-Yu Chen0
Chia-Chen Chen0
Chia-Ching Huang0
Chia-Hao Hsu0
Date of Patent
January 16, 2018
Patent Application Number
15194118
Date Filed
June 27, 2016
Patent Citations Received
0
0
...
Patent Primary Examiner
Patent abstract
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
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