Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
En Hao Lai0
Li-Jui Chen0
Po-Chung Cheng0
Shang-Chieh Chien0
Chi Yang0
Date of Patent
September 10, 2024
0Patent Application Number
181429130
Date Filed
May 3, 2023
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.
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