Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chien-Fu Lee0
Hoi-Tou Ng0
Shih-Ming Chang0
Date of Patent
December 27, 2016
0Patent Application Number
142439850
Date Filed
April 3, 2014
0Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Provided herein is a method of improving a transference of a mask pattern into a material layer on a semiconductor wafer. The method includes steps of receiving a semiconductor mask made from a desired design layout and of patterning the material layer present on a plurality of semiconductor wafers with the mask having the mask pattern and an illumination pattern. The method further includes steps of identifying defects and/or defect patterns in the transference of the mask pattern on the plurality of semiconductor wafers, determining an illumination modification, and applying the illumination modification to the illumination pattern to create a modified illumination pattern. Additional methods and associated systems are also provided.
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