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US Patent 9529268 Systems and methods for improving pattern transfer

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
April 3, 2014
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Date of Patent
December 27, 2016
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Patent Application Number
14243985
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Patent Citations Received
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US Patent 12135499 Reticle enclosure for lithography systems
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US Patent 12114411 Apparatus and method for generating extreme ultraviolet radiation
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US Patent 12114412 Shock wave visualization for extreme ultraviolet plasma optimization
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US Patent 12119129 EUV lithography apparatus
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US Patent 12117725 Pellicle for an EUV lithography mask and a method of manufacturing thereof
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US Patent 12130556 Plasma position control for extreme ultraviolet lithography light sources
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US Patent 12130548 Extreme ultraviolet mask with reduced wafer neighboring effect
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US Patent 11662656 Mask and method of forming the same
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US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
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US Patent 11681234 Mask for attracting charged particles and method for using the same
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•••
Patent Inventor Names
Chien-Fu Lee
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Hoi-Tou Ng
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Shih-Ming Chang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9529268
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Patent Primary Examiner
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Steven H Whitesell Gordon
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