Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 8, 2021
Patent Application Number
16579660
Date Filed
September 23, 2019
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
