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US Patent 11029324 Particle image velocimetry of extreme ultraviolet lithography systems

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Patent Citations Received
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US Patent 12114412 Shock wave visualization for extreme ultraviolet plasma optimization
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US Patent 12085585 Particle image velocimetry of extreme ultraviolet lithography systems
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Patent abstract

A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.

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US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
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https://pdfpiw.uspto.gov/.piw?Docid=1102932400
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Infobox
Is a
Patent
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
110293240
Date of Patent
June 8, 2021
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Patent Application Number
165796600
Date Filed
September 23, 2019
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=110293240
Patent Primary Examiner
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David A. Vanore
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Edits on 27 Sep, 2022
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
110293240
Date of Patent
June 8, 2021
0
Patent Application Number
165796600
Date Filed
September 23, 2019
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=110293240
Patent Primary Examiner
‌
David A. Vanore
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https://pdfpiw.uspto.gov/.piw?Docid=11029324
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 US Patent 11029324 Particle image velocimetry of extreme ultraviolet lithography systems

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
11029324
Date of patent
June 8, 2021
Patent application number
16579660
Date Filed
September 23, 2019
Patent primary examiner
‌
David A. Vanore

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