Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsin-Chang Lee0
Tao-Min Huang0
Anthony Yen0
Chia-Jen Chen0
Chih-Tsung Shih0
Date of Patent
January 16, 2018
Patent Application Number
15096009
Date Filed
April 11, 2016
Patent Citations Received
0
0
...
Patent Primary Examiner
Patent abstract
Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.