Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsin-Chang Lee0
Ta-Cheng Lien0
Tzu Yi Wang0
Pei-Cheng Hsu0
Date of Patent
September 10, 2024
0Patent Application Number
182261510
Date Filed
July 25, 2023
0Patent Citations
...
Patent Primary Examiner
Patent abstract
In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
