US Patent 12085843 Method of manufacturing EUV photo masks
Patent 12085843 was granted and assigned to Taiwan Semiconductor Manufacturing Company on September, 2024 by the United States Patent and Trademark Office.
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US Patent 12085843 Method of manufacturing EUV photo masks
Article
Patent abstract
In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsin-Chang Lee0
Pei-Cheng Hsu0
Ta-Cheng Lien0
Tzu Yi Wang0
Date of Patent
September 10, 2024
0Patent Application Number
182261510
Date Filed
July 25, 2023
0Patent Citations
Patent Primary Examiner
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