Is a
Patent attributes
Patent Applicant
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tzu Yi Wang
Ta-Cheng Lien
Pei-Cheng Hsu
Hsin-Chang Lee
Date of Patent
October 17, 2023
Patent Application Number
17461520
Date Filed
August 30, 2021
Patent Citations
...
Patent Citations Received
Patent Primary Examiner
Patent abstract
In a method of manufacturing a photo mask, an etching mask layer having circuit patterns is formed over a target layer of the photo mask to be etched. The photo mask includes a backside conductive layer. The target layer is etched by plasma etching, while preventing active species of plasma from attacking the backside conductive layer.
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