US Patent 12085585 Particle image velocimetry of extreme ultraviolet lithography systems
Patent 12085585 was granted and assigned to Taiwan Semiconductor Manufacturing Company on September, 2024 by the United States Patent and Trademark Office.
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US Patent 12085585 Particle image velocimetry of extreme ultraviolet lithography systems
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Patent abstract
A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.
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Patent Applicant
Current Assignee
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Patent Number
Patent Inventor Names
Chi Yang0
En Hao Lai0
Li-Jui Chen0
Po-Chung Cheng0
Shang-Chieh Chien0
Date of Patent
September 10, 2024
0Patent Application Number
181429130
Date Filed
May 3, 2023
0Patent Citations
Patent Primary Examiner
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