US Patent 12013630 EUV photo masks and manufacturing method thereof
Patent 12013630 was granted and assigned to Taiwan Semiconductor Manufacturing Company on June, 2024 by the United States Patent and Trademark Office.
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US Patent 12013630 EUV photo masks and manufacturing method thereof
Article
Patent abstract
A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The intermediate layer includes a material having a lower hydrogen diffusivity than a material of the capping layer.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsin-Chang Lee0
Pei-Cheng Hsu0
Ta-Cheng Lien0
Date of Patent
June 18, 2024
0Patent Application Number
179917400
Date Filed
November 21, 2022
0Patent Citations
Patent Primary Examiner
CPC Code
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