Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shih-Wen Liu0
Hsien-Cheng Wang0
Hsin-Ying Lin0
Mei-Yun Wang0
Fu-Kai Yang0
Hsiao-Chiu Hsu0
Date of Patent
February 8, 2022
0Patent Application Number
169394650
Date Filed
July 27, 2020
0Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
Semiconductor structures are provided. The semiconductor structure includes a substrate and a metal gate structure formed over the substrate. The semiconductor structure further includes a sealing layer comprising an inner sidewall and an outermost sidewall. In addition, the inner sidewall is in direct contact with the metal gate structure and the outermost sidewall is away from the metal gate structure. The semiconductor structure further includes a mask structure formed over the metal gate structure. In addition, the mask structure has a straight sidewall over the metal gate structure and a sloped sidewall extending from the inner sidewall of the sealing layer and passing over the outmost sidewall of the sealing layer.
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