Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 22, 2022
Patent Application Number
16478436
Date Filed
December 28, 2017
Patent Citations Received
Patent Primary Examiner
CPC Code
Patent abstract
To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.
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