US Patent 11279905 Semiconductor substrate cleaning agent
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Patent abstract
To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.
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Patent Number
112799050
Date of Patent
March 22, 2022
0Patent Application Number
164784360
Date Filed
December 28, 2017
0Official Website
Patent Primary Examiner
CPC Code
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Patent Jurisdiction
Patent Number
112799050
Date of Patent
March 22, 2022
0Patent Application Number
164784360
Date Filed
December 28, 2017
0Official Website
Patent Primary Examiner
CPC Code
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US Patent 11279905 Semiconductor substrate cleaning agent
Infobox
Is a
Patent jurisdiction
Patent number
11279905
Date of patent
March 22, 2022
Patent application number
16478436
Date Filed
December 28, 2017
Patent primary examiner
CPC Code
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