US Patent 11281111 Off-axis illumination overlay measurement using two-diffracted orders imaging
Patent 11281111 was granted and assigned to KLA-Tencor on March, 2022 by the United States Patent and Trademark Office.
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Patent Inventor Names
Amnon Manassen0
Ariel Hildesheim0
Gilad Laredo0
Shlomo Eisenbach0
Vladimir Levinski0
Yoni Shalibo0
Yuri Paskover0
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Patent Number
112811110
Date of Patent
March 22, 2022
0Patent Application Number
163176030
Date Filed
December 14, 2018
0Official Website
Patent Citations
Patent Primary Examiner
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US Patent 11281111 Off-axis illumination overlay measurement using two-diffracted orders imaging
Article
Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices. Methods comprise illuminating the target in a Littrow configuration to yield a first measurement signal comprising a −1
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
11281111
Date of patent
March 22, 2022
Patent application number
16317603
Date Filed
December 14, 2018
Patent citations
Patent primary examiner
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