Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yun-Yue Lin0
Ta-Cheng Lien0
Jeng-Horng Chen0
Hsin-Chang Lee0
Chih-Cheng Lin0
Amo Chen0
Date of Patent
April 5, 2022
0Patent Application Number
167413420
Date Filed
January 13, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a porous pellicle frame, a mask with a patterned surface, a first thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame, and a second thermal conductive adhesive layer that secures the porous pellicle frame to the mask.
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