US Patent 11378882 Chemical composition for tri-layer removal
Patent 11378882 was granted and assigned to Taiwan Semiconductor Manufacturing Company on July, 2022 by the United States Patent and Trademark Office.
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Patent Inventor Names
Chia-Wei Wu0
Jian-Jou Lian0
Kuo Bin Huang0
Li-Min Chen0
Neng-Jye Yang0
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US Patent 11378882 Chemical composition for tri-layer removal
Article
A method includes forming a tri-layer. The tri-layer includes a bottom layer; a middle layer over the bottom layer; and a top layer over the middle layer. The top layer includes a photo resist. The method further includes removing the top layer; and removing the middle layer using a chemical solution. The chemical solution is free from potassium hydroxide (KOH), and includes at least one of a quaternary ammonium hydroxide and a quaternary ammonium fluoride.
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Patent number
11378882
Date of patent
July 5, 2022
Patent application number
17007733
Date Filed
August 31, 2020
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