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US Patent 11396701 Passivation against vapor deposition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
December 28, 2020
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Date of Patent
July 26, 2022
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Patent Application Number
17135001
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Patent Citations
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US Patent 10014212 Selective deposition of metallic films
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US Patent 10041166 Reaction chamber passivation and selective deposition of metallic films
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US Patent 10047435 Dual selective deposition
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US Patent 10049924 Selective formation of metallic films on metallic surfaces
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US Patent 10115603 Removal of surface passivation
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US Patent 10157786 Selective formation of metallic films on metallic surfaces
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US Patent 10186420 Formation of silicon-containing thin films
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US Patent 10204782 Combined anneal and selective deposition process
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US Patent 10343186 Vapor phase deposition of organic films
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US Patent 10373820 Deposition of organic films
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•••
Patent Inventor Names
Eva E. Tois
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Varun Sharma
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11396701
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Patent Primary Examiner
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Elizabeth A Burkhart
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CPC Code
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C23C 16/042
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C23C 16/18
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C23C 16/405
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C23C 16/4404
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C23C 16/45525
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C23C 16/04
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H01L 21/0228
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C23C 16/0272
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