Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
HaSeok Jang0
WonKi Jeong0
JuIll Lee0
Date of Patent
August 30, 2022
0Patent Application Number
169388680
Date Filed
July 24, 2020
0Patent Citations Received
Patent Primary Examiner
A substrate processing apparatus having an improved exhaust structure includes a reaction space formed between a processing unit and a substrate support unit, an exhaust unit surrounding the reaction space, an exhaust port with a channel inside, a partition wall with an exhaust line inside, wherein the channel of the exhaust port connects the exhaust unit and the exhaust line.
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