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US Patent 11435666 Salt compound, chemically amplified resist composition, and patterning process

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Is a

1

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

1

Patent Number

Patent Inventor Names

Emiko Ono1

Masahiro Fukushima1

Masayoshi Sagehashi1

Yuki Kera1

Date of Patent

September 6, 2022

1

Patent Application Number

166697801

Date Filed

October 31, 2019

1

Patent Citations

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Patent Primary Examiner

Amanda C. Walke

1

CPC Code

1

A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.

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