Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takayuki Fujiwara0
Masaki Ohashi0
Ryosuke Taniguchi0
Date of Patent
January 15, 2019
0Patent Application Number
157030370
Date Filed
September 13, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.
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