On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.

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Masaki Ohashi0

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US Patent 11459340 Tri-substituted heteroaryl derivatives as Src homology-2 phosphatase inhibitors

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US Patent 11518772 Fused tricyclic ring derivatives as Src homology-2 phosphate inhibitors

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US Patent 11034705 Fused tricyclic ring derivatives as Src homology-2 phosphate inhibitors

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US Patent 11435666 Salt compound, chemically amplified resist composition, and patterning process

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US Patent 10894797 Fused tricyclic ring derivatives as SRC homology-2 phosphatase inhibitors

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US Patent 11518772 Fused tricyclic ring derivatives as Src homology-2 phosphate inhibitors

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US Patent 11459340 Tri-substituted heteroaryl derivatives as Src homology-2 phosphatase inhibitors

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United States Patent and Trademark Office

Patent Number

101806260

Date of Patent

January 15, 2019

Patent Application Number

157030370

Date Filed

September 13, 2017

Patent Citations Received

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US Patent 10894797 Fused tricyclic ring derivatives as SRC homology-2 phosphatase inhibitors

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US Patent 11034705 Fused tricyclic ring derivatives as Src homology-2 phosphate inhibitors

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US Patent 11435666 Salt compound, chemically amplified resist composition, and patterning process

Patent Primary Examiner

‌

Amanda C. Walke

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US Patent 10894797 Fused tricyclic ring derivatives as SRC homology-2 phosphatase inhibitors

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US Patent 11435666 Salt compound, chemically amplified resist composition, and patterning process

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US Patent 11034705 Fused tricyclic ring derivatives as Src homology-2 phosphate inhibitors

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US Patent 10180626 Sulfonium salt, resist composition, and patterning process

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Patent

Patent jurisdiction

United States Patent and Trademark Office

Patent number

10180626

Date of patent

January 15, 2019

Patent application number

15703037

Date Filed

September 13, 2017

Patent primary examiner

‌

Amanda C. Walke

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