Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 6, 2022
Patent Application Number
17072719
Date Filed
October 16, 2020
Patent Citations
Patent Citations Received
Patent Primary Examiner
Semiconductor devices and methods of manufacturing are presented in which inner spacers for nanostructures are manufactured. In embodiments a dielectric material is deposited for the inner spacer and then treated. The treatment may add material and cause an expansion in volume in order to close any seams that can interfere with subsequent processes.
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