Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yung-Cheng Lu0
Hung Cheng Lin0
Che-Hao Chang0
Chi On Chui0
Wan-Yi Kao0
Date of Patent
February 27, 2024
0Patent Application Number
178545990
Date Filed
June 30, 2022
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Semiconductor devices and methods of manufacturing are presented in which inner spacers for nanostructures are manufactured. In embodiments a dielectric material is deposited for the inner spacer and then treated. The treatment may add material and cause an expansion in volume in order to close any seams that can interfere with subsequent processes.
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