Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ching-Hong Jiang0
Shih-Chiang Chen0
Teng-Chun Tsai0
Li-Ting Wang0
Date of Patent
November 22, 2016
Patent Application Number
14932777
Date Filed
November 4, 2015
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
An embodiment method includes forming a nanowire extending upwards from a substrate, wherein the nanowire includes: a bottom semiconductor region; a middle semiconductor region over the bottom semiconductor region; and a top semiconductor region over the middle semiconductor region. The method also includes forming a dielectric layer around and extending over the nanowire and forming a chemical mechanical polish-stop (CMP-stop) layer within the dielectric layer using an implantation process. After forming the CMP-stop layer, the dielectric layer is planarized.
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