Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chih-Hao Wang0
Kuo-Cheng Chiang0
Zhi-Chang Lin0
Shi-Ning Ju0
Kuan-Ting Pan0
Date of Patent
September 10, 2024
0Patent Application Number
182972930
Date Filed
April 7, 2023
0Patent Citations
...
Patent Primary Examiner
CPC Code
Patent abstract
A semiconductor device structure is provided. The semiconductor device structure includes first nanostructures and second nanostructures stacked in a vertical direction over a substrate, and a first dummy fin structure between the first nanostructures and the second nanostructures. The semiconductor device structure includes a first gate structure formed over the first nanostructures, wherein the first gate structure includes a gate dielectric layer, and the gate dielectric layer is in direct contact with a sidewall surface of the first dummy fin structure.
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