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US Patent 11492701 Reactor manifolds

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

March 9, 2020

Date of Patent

November 8, 2022

Patent Application Number

16813527

Patent Citations

US Patent 10280509 Lid assembly for a processing system to facilitate sequential deposition techniques

US Patent 10358407 Synthesis and use of precursors for vapor deposition of tungsten containing thin films

US Patent 10370761 Pulsed valve manifold for atomic layer deposition

US Patent 10468291 Reaction system for growing a thin film

US Patent 10480072 Semiconductor processing reactor and components thereof

US Patent 10662527 Manifolds for uniform vapor deposition

US Patent 10683571 Gas supply manifold and method of supplying gases to chamber using same

US Patent 11014866 Synthesis and use of precursors for vapor deposition of tungsten containing thin films

US Patent 10844486 Semiconductor processing reactor and components thereof

US Patent 11047042 Synthesis and use of precursors for ALD of molybdenum or tungsten containing thin films

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Jeffrie R. Lund

CPC Code

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