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US Patent 10844486 Semiconductor processing reactor and components thereof

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

November 24, 2020

Patent Application Number

16598768

Date Filed

October 10, 2019

Patent Citations

US Patent 10347547 Suppressing interfacial reactions by varying the wafer temperature throughout deposition

US Patent 10400335 Dual-direction chemical delivery system for ALD/CVD chambers

US Patent 10428419 Combination CVD/ALD method, source and pulse profile modification

US Patent 10435790 Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap

US Patent 10468244 Precursors and flowable CVD methods for making low-K films to fill surface features

US Patent 10468251 Method for forming spacers using silicon nitride film for spacer-defined multiple patterning

US Patent 10483154 Front-end-of-line device structure and method of forming such a front-end-of-line device structure

US Patent 10529554 Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches

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Patent Citations Received

US Patent 11377737 Manifolds for uniform vapor deposition

US Patent 11830731 Semiconductor deposition reactor manifolds

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US Patent 11961716 Atomic layer deposition method

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US Patent 11492701 Reactor manifolds

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