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US Patent 10844486 Semiconductor processing reactor and components thereof

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
October 10, 2019
Date of Patent
November 24, 2020
Patent Application Number
16598768
Patent Citations
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US Patent 10347547 Suppressing interfacial reactions by varying the wafer temperature throughout deposition
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US Patent 10400335 Dual-direction chemical delivery system for ALD/CVD chambers
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US Patent 10428419 Combination CVD/ALD method, source and pulse profile modification
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US Patent 10435790 Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
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US Patent 10468244 Precursors and flowable CVD methods for making low-K films to fill surface features
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US Patent 10468251 Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
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US Patent 10483154 Front-end-of-line device structure and method of forming such a front-end-of-line device structure
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US Patent 10529554 Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
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US Patent 10032628 Source/drain performance through conformal solid state doping
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US Patent 10018920 Lithography patterning with a gas phase resist
•••
Patent Citations Received
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US Patent 11377737 Manifolds for uniform vapor deposition
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US Patent 11830731 Semiconductor deposition reactor manifolds
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US Patent 11961716 Atomic layer deposition method
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US Patent 11492701 Reactor manifolds
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10844486
Patent Primary Examiner
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Yuechuan Yu

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