Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 10, 2018
Patent Application Number
15061860
Date Filed
March 4, 2016
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Disclosed is a method for lithography patterning. The method includes providing a substrate, forming a deposition enhancement layer (DEL) over the substrate, and flowing an organic gas near a surface of the DEL. During the flowing of the organic gas, the method further includes irradiating the DEL and the organic gas with a patterned radiation. Elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL. The method further includes etching the DEL with the resist pattern as an etch mask, thereby forming a patterned DEL.
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