Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 25, 2022
Patent Application Number
15940729
Date Filed
March 29, 2018
Patent Citations
Patent Citations Received
Patent Primary Examiner
Patent abstract
The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.
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