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US Patent 11230766 Substrate processing apparatus and method

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Date Filed
March 29, 2018
Date of Patent
January 25, 2022
Patent Application Number
15940729
Patent Citations
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US Patent 10262859 Process for forming a film on a substrate using multi-port injection assemblies
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US Patent 10312055 Method of depositing film by PEALD using negative bias
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US Patent 10312129 Variable adjustment for precise matching of multiple chamber cavity housings
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US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition
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US Patent 10322384 Counter flow mixer for process chamber
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US Patent 10332963 Uniformity tuning of variable-height features formed in trenches
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US Patent 10032628 Source/drain performance through conformal solid state doping
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US Patent 10014212 Selective deposition of metallic films
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US Patent 10017856 Flowable gapfill using solvents
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US Patent 10018920 Lithography patterning with a gas phase resist
•••
Patent Citations Received
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US Patent D956705 Cooling plate for a semiconductor processing apparatus
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US Patent 11918715 Polarized LED filtration system
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11230766
Patent Primary Examiner
‌
Jeffrie R. Lund

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