Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
November 22, 2022
Patent Application Number
17375122
Date Filed
July 14, 2021
Patent Citations
Patent Primary Examiner
Methods of forming and processing semiconductor devices which utilize the selective etching of aluminum oxide over silicon oxide, silicon nitride, aluminum oxide or zirconium oxide are described. Certain embodiments relate to the formation of self-aligned contacts for metal gate applications.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
