Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ziwei Fang0
Chung-Liang Cheng0
Date of Patent
December 20, 2022
0Patent Application Number
171760520
Date Filed
February 15, 2021
0Patent Citations
Patent Primary Examiner
A semiconductor structure includes a metal gate structure disposed over a semiconductor substrate, an interlayer dielectric (ILD) layer disposed over the metal gate structure, and a gate contact disposed in the ILD layer and over the metal gate structure, where a bottom surface of the gate contact is defined by a barrier layer disposed over the metal gate structure, where sidewall surfaces of the gate contact are defined by and directly in contact with the ILD layer, and where the barrier layer is free of nitrogen.
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