US Patent 11567406 Positive resist composition and patterning process
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US Patent 11567406 Positive resist composition and patterning process
Article
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of an iodized or brominated phenol, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
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Patent Jurisdiction
Patent Number
115674060
Date of Patent
January 31, 2023
0Patent Application Number
169180820
Date Filed
July 1, 2020
0Patent Citations
Patent Primary Examiner
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